Print Email Facebook Twitter Development of APCVD process for high quality TCO Title Development of APCVD process for high quality TCO Author van Deelen, J. van Mol, A.M.B. Poodt, P.W.G. Grob, F. Spee, C.I.M.A. TNO Industrie en Techniek Publication year 2009 Abstract For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is therefore expected to provide a breakthrough for lowering the price of thin film PV modules. 2009 IEEE. Subject MaterialsIndustrial InnovationAtmospheric deposition processAtmospheric pressure CVDHigh qualityPlasma-enhanced CVDPV modulesResearch and developmentRoll to roll manufacturingTransparent conductive oxidesAtmospheric pressureDepositionMeteorological problemsPlasma depositionTinTin oxidesTitanium compoundsZincZinc oxideChemical vapor deposition To reference this document use: http://resolver.tudelft.nl/uuid:834dafb6-8bb1-4890-b9d8-0a72528bb3c8 TNO identifier 352070 ISBN 9781424429509 ISSN 0160-8371 Source 2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009, 7 June 2009 through 12 June 2009, Philadelphia, PA, USA. reference code: 79913, 271-275 Article number No.: 5411680 Document type conference paper Files To receive the publication files, please send an e-mail request to TNO Library.