Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al2O3

Title

Infrared and Optical Emission Spectroscopy on Atmospheric-Pressure Plasma-Enhanced Spatial ALD of Al2O3

Author

Mione, M.A.
Creyghton, Y.
Engeln, R.
Kessels, W.M.M.
Roozeboom, F.

Publication year

2019

Subject

Industrial Innovation
Atomic layer etching
ALE
Infrared spectroscopy
Atomic layer deposition
Spatial ALD
Etching

To reference this document use:

http://resolver.tudelft.nl/uuid:7bb77c33-1553-4a48-a3c0-42133b6b96a1

TNO identifier

870177

Bibliographical note

TNO Semicon Innovation Day, Delft, May 21, 2019

Document type

public lecture