Title
Isotropic Atomic Layer Etching of ZnO on 2D and 3D substrates, using acetylacetone and O2 plasma
Author
Mameli, A.
Verheijen, M.A.
Mackus, A.J.M.
Kessels, W.M.M.
Roozeboom, F.
Publication year
2018
Subject
Chemistry Physics Materials
Industrial Innovation
Atomic layer etching
ALE
Acetylacetone
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http://resolver.tudelft.nl/uuid:79f4e696-dfdf-42dd-8b84-21ef1d6cb5c0
TNO identifier
814724
Bibliographical note
7th International Conference on Microelectronics and Plasma Technology, ICMAP 2018, Joint International Conference on ICMAP 2018, APCPST 2018, and ISPB 2018, July 24-28, 2018, Sondo Convensia, Incheoon, Korea(Invited).
Document type
public lecture