Title
Pico meter metrology for the GAIA mission
Author
Meijer, E.A.
Nijenhuis, J.N.
Vink, R.J.P.
Kamphues, F.G.
Gielesen, W.L.M.
Coatantiec, C.
TNO Industrie en Techniek
Contributor
Warren, P.G. (editor)
Marshall, C.J. (editor)
Tyson, R.K. (editor)
Lloyd-Hart, M. (editor)
Heaney, J.B. (editor)
Kvamme, E.T. (editor)
Publication year
2009
Abstract
To measure the relative motions of GAIA's telescopes, the angle between the telescopes is monitored by an all Silicon Carbide Basic Angle Monitoring subsystem (BAM OMA). TNO is developing this metrology system. The stability requirements for this metrology system go into the pico meter and pico radian range. Such accuracies require extreme measures and extreme stability. Specific topics addressed are mountings of opto-mechanical components, gravity deformation, materials and tests that were necessary to prove that the requirements are feasible. Especially mounting glass components on Silicon Carbide and mastering the Silicon Carbide material proved to be a challenge. © 2009 SPIE.
Subject
Opto-mechanics
Silicon carbide
Stability
Static determined structure
To reference this document use:
http://resolver.tudelft.nl/uuid:740034da-6f8d-491b-bd1f-63a43c06f367
TNO identifier
248219
ISBN
9780819477293
ISSN
0277-786X
Source
Astronomical and Space Optical Systems, 2-3 August 2009, San Diego, CA, USA, 7439
Series
Proceedings of SPIE - The International Society for Optical Engineering
Article number
743915
Document type
conference paper