Print Email Facebook Twitter Tin oxide precursor chemistry and its link to coating properties Title Tin oxide precursor chemistry and its link to coating properties Author TNO Industrie en Techniek Technisch Physische Dienst TNO - TH van Mol, A.M.B. Alcott, G.R. Allendorf, M.D. Publication year 2005 Abstract The chemical vapor deposition technique to optimize the manufacture of SnO2 coated glasses was presented. SnO2 growth rates for several precursors were examined and their relative magnitudes were compared with the properties of the deposit, taking into account the chemical nature of the precursor. A set of growth rates and the morphological data obtained, using a stagnation point flow reactor were also analyzed. It was found that TTC/O 2 precursor system yields either extremely poor quality films or no films, and deposition from TTC/O2 cannot be described as a thin film. Subject Chemical vapor depositionCoatingsData acquisitionOptimizationThin filmsTin compoundsPoor quality filmsPrecursor systemsTin oxideGlass ceramics To reference this document use: http://resolver.tudelft.nl/uuid:7344d6c8-040f-4215-95fe-334a94f9186c TNO identifier 238285 Publisher American Ceramic Society ISSN 0002-7812 Source American Ceramic Society Bulletin, 84 (84), 37-41 Document type article Files To receive the publication files, please send an e-mail request to TNO Library.