Title
Realisation of a vacuum system of an EUV Exposure System
Author
Molkenboer, F.T.
Publication year
2017
Abstract
EBL2 is not a setup for producing semiconductor devices. The experiments for which EBL2 is intended are: accelerated lifetime tests for EUV Mirrors; EUV Reticles and pellicles; and Materials used in EUV lithography. This kind of research is needed due to the harsh EUV environment, and EUV lithography is coming to market. EBL2 is able to manipulate and to illuminate EUV reticles with scanner compatibility.
Subject
Electronics
High Tech Systems & Materials
Industrial Innovation
Nano Technology
NI - Nano Instrumentation OM - Opto-Mechatronics IM - Instrument Manufacturing SSE - Space Systems Engineering
TS - Technical Sciences
To reference this document use:
http://resolver.tudelft.nl/uuid:5f7874e2-4694-4a8d-92e2-0bb811c33bfd
TNO identifier
763217
Publisher
TNO, Delft
Source
NEVAC Day (Nederlandse Vacuum Vereniging), 12 May 2017, DIFFER, Eindhoven, The Netherlands
Bibliographical note
Met medewerking van N.B. Koster, A.E. Abutan, A.F. Deutz, J.R.H. Diesveld, C.L. Hollemans, A.M. Hoogstrate, P.J. Kerkhof, P.M. Muilwijk, W.F.W. Mulckhuyse, B.A.H. Nijland, B.W. Oostdijck, M. van Putten, E. te Sligte, P. van der Walle, en J. Westerhout
Document type
public lecture