Realisation of a vacuum system of an EUV Exposure System
EBL2 is not a setup for producing semiconductor devices. The experiments for which EBL2 is intended are: accelerated lifetime tests for EUV Mirrors; EUV Reticles and pellicles; and Materials used in EUV lithography. This kind of research is needed due to the harsh EUV environment, and EUV lithography is coming to market. EBL2 is able to manipulate and to illuminate EUV reticles with scanner compatibility.
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High Tech Systems & Materials
NI - Nano Instrumentation OM - Opto-Mechatronics IM - Instrument Manufacturing SSE - Space Systems Engineering
TS - Technical Sciences
NEVAC Day (Nederlandse Vacuum Vereniging), 12 May 2017, DIFFER, Eindhoven, The Netherlands
Met medewerking van N.B. Koster, A.E. Abutan, A.F. Deutz, J.R.H. Diesveld, C.L. Hollemans, A.M. Hoogstrate, P.J. Kerkhof, P.M. Muilwijk, W.F.W. Mulckhuyse, B.A.H. Nijland, B.W. Oostdijck, M. van Putten, E. te Sligte, P. van der Walle, en J. Westerhout