Title
EUV mask lifetime testing using EBL2
Author
Wu, C.C.
te Sligte, E.
Bekman, H.
Storm, A.J.
van Putten, M.
Limpens, M.P.M.A.
van Veldhoven, J.
Deutz, A.F.
Contributor
Goldberg, K.A. (editor)
Publication year
2018
Abstract
EBL2 is TNO's platform for EUV exposure testing and surface analysis. EBL2 is capable of generating conditions relevant to EUV mask operation at all foreseen source power nodes. The authors describe how TNO performs a customized (accelerated) lifetime test on EUV masks. The required gas, EUV, and thermal parameters will be considered, and related to simulated and measured performance of EBL2. This approach can also be applied to EUV pellicles and optics.
Subject
High Tech Systems & Materials
Electronics
Industrial Innovation
Pellicle
Photomasks
XPS
Extreme ultraviolet lithography
Surface analysis
X-ray photoelectron spectroscopy
EUV mask
Exposure testing
Lifetime testing
Power nodes
Thermal parameters
To reference this document use:
http://resolver.tudelft.nl/uuid:5b375718-6c2d-4d7b-ab0f-9511e51b8541
TNO identifier
810142
Publisher
SPIE
ISBN
9781510616585
ISSN
0277-786X
Source
Extreme Ultraviolet (EUV) Lithography IX 2018, 26 February - 1 March 2018, 10583
Article number
1058310
Document type
conference paper