Title
First results from the Large Dynamic Range Atomic Force Microscope for overlay metrology
Author
Witvoet, G.
Peters, J.
Kuiper, S.
Keyvani, S.
Willekers, R.W.
Contributor
Ukraintsev, V.A. (editor)
Adan, O. (editor)
Publication year
2019
Abstract
TNO is developing a novel Large Dynamic Range Atomic Force Microscope (LDR-AFM), primarily but not exclusively designed for sub-nm accurate overlay metrology. The LDR-AFM combines an AFM with a 6 degrees- of-freedom interferometric positioning stage, thereby enabling measurements of sub-nm features on a wafer over multiple millimeters marker-to-feature distances. The current work provides an overview of recent developments and presents the first results obtained after final integration of the complete system. This includes results on the AFM head development, the validated positioning stage performance, the first AFM images, and long-term stability measurements.
Subject
High Tech Systems & Materials
Industrial Innovation
AFM
LDR-AFM
Control
Identification
Metrology
Overlay
Positioning
Atomic force microscopy
Microscopy
To reference this document use:
http://resolver.tudelft.nl/uuid:5529a327-699d-47ec-b639-c24d2d68a078
DOI
https://doi.org/10.1117/12.2514044/
TNO identifier
867797
Publisher
SPIE
ISBN
9781510625655
ISSN
0277-786X
Source
Proceedings Metrology, Inspection, and Process Control for Microlithography XXXIII, 25-28 February 2019, San Jose, CA, USA
Article number
109592E
Document type
conference paper