Title
Atomic Layer Deposition Applications 10: Preface
Author
Roozeboom, F.
De Gendt, S.
Delabie, A.
Elam, J.W.
Londergan, A.
van der Straten, O.
Publication year
2014
Subject
Mechatronics, Mechanics & Materials
TFT - Thin Film Technology
TS - Technical Sciences
Energy
Industrial Innovation
To reference this document use:
http://resolver.tudelft.nl/uuid:3ff1762b-67be-44bb-adec-f76303999286
TNO identifier
513291
Publisher
ECS
Source
International symposium on Atomic Layer Deposition Applications 10, held during the 226th Meeting of the Electrochemical Society. This meeting was held as a Joint International Meeting with the XXIX Congreso de la Sociedad Mexicana de Electroquímica (SMEQ) from Oct. 5 to 9, 2014, in the Moon Palace Resort in Cancun, Mexico., 64 (9), I-VII
Series
ECS Transactions
Document type
conference paper