Title
Isotropic ALE of ZnO using Hacac and O2 plasma
Author
Mameli, A.
Verheijen, M.A.
Mackus, A.J.M.
Kessels, W.M.M.
Roozeboom, F.
Publication year
2019
Subject
Industrial Innovation
Atomic layer etching
ALE
ZnO
Atomic layer deposition
ALD
Plasma etching
Zinc oxide
Isotropic materials
Isotropic removal
Nanowires
Infrared spectroscopy
To reference this document use:
http://resolver.tudelft.nl/uuid:2a36c73e-6dcc-44bf-9fdf-93ef96675824
TNO identifier
862231
Bibliographical note
SPIE Conference on Advanced Etch Technology for Nanopatterning VIII, San Jose (California), USA, Feb. 24 – 28, 2019, presented by Erwin Kessels
Document type
public lecture