Print Email Facebook Twitter Subsurface Ultrasonic Resonant Force Microscopy for Image-based Overlay Measurement Title Subsurface Ultrasonic Resonant Force Microscopy for Image-based Overlay Measurement Author Tamer, M.S. van Es, M.H. Sadeghian Marnani, H. van der Lans, M.J. Publication year 2019 Abstract Scanning Probe Microscopy (SPM) has emerged as a metrology solution for the semiconductor industry enabling high throughput defect review and high resolution 3D metrology. TNO has developed a Subsurface Ultrasonic Resonant Force Microscopy (SSURFM) for non-destructive, high resolution imaging of features buried under one or more layers of material. Challenging targeted applications for this technique are overlay metrology and wafer alignment through optically opaque layers and overlay and alignment on product features, which requires device resolution. Using the TNO SSURFM technique, sub-surface measurements on two overlay and alignment targets have been performed. The goal of this study is to show the potential of the technique for Overlay/Alignment Applications. Subject High Tech Systems & MaterialsIndustrial InnovationSubsurface ultrasonic resonant force microscopy (SSURFM)MicroscopyImage-based Overlay MeasurementScanning probe microscopy (SPM)ERP Early Research ProgramERP 3D Nanomanufacturing Instruments To reference this document use: http://resolver.tudelft.nl/uuid:256fe32a-e62f-467c-950f-1e0f9e3f06ab TNO identifier 867692 Publisher TNO, Delft Source SID Semicon Innovation Day, Science Centre Delft, 21 May 2019 Bibliographical note Presented poster Document type other Files To receive the publication files, please send an e-mail request to TNO Library.