Title
Subsurface Ultrasonic Resonant Force Microscopy for Image-based Overlay Measurement
Author
Tamer, M.S.
van Es, M.H.
Sadeghian Marnani, H.
van der Lans, M.J.
Publication year
2019
Abstract
Scanning Probe Microscopy (SPM) has emerged as a metrology solution for the semiconductor industry enabling high throughput defect review and high resolution 3D metrology. TNO has developed a Subsurface Ultrasonic Resonant Force Microscopy (SSURFM) for non-destructive, high resolution imaging of features buried under one or more layers of material. Challenging targeted applications for this technique are overlay metrology and wafer alignment through optically opaque layers and overlay and alignment on product features, which requires device resolution. Using the TNO SSURFM technique, sub-surface measurements on two overlay and alignment targets have been performed. The goal of this study is to show the potential of the technique for Overlay/Alignment Applications.
Subject
High Tech Systems & Materials
Industrial Innovation
Subsurface ultrasonic resonant force microscopy (SSURFM)
Microscopy
Image-based Overlay Measurement
Scanning probe microscopy (SPM)
ERP Early Research Program
ERP 3D Nanomanufacturing Instruments
To reference this document use:
http://resolver.tudelft.nl/uuid:256fe32a-e62f-467c-950f-1e0f9e3f06ab
TNO identifier
867692
Publisher
TNO, Delft
Source
SID Semicon Innovation Day, Science Centre Delft, 21 May 2019
Bibliographical note
Presented poster
Document type
other