Title
44-1: Invited Paper: Photolithography as Enabler of AMOLED Displays Beyond 1000 ppi
Author
Malinowski, P.E.
Ke, T.
Nakamura, A.
Vicca, P.
Kronemeijer, A.J.
Ameys, M.
van der Steen, J.L.
Steudel, S.
Kamochi, Y.
Iwai, Y.
Gelinck, G.
Heremans, P.
Publication year
2017
Abstract
This paper describes the potential of hi-res display fabrication using OLED photolithography. We demonstrate 1250 ppi multicolor arrays, pixel scaling down to 3 μm pitch, integration in active displays, and improving lifetime after patterning (200 hours T75, smOLEDs). Photolithography can enable low-cost, high resolution displays for the 8K – VR era.
Subject
Nano Technology
HOL - Holst
TS - Technical Sciences
Electronics
Industrial Innovation
RGB OLEDs
Photolithography
AMOLED displays
Organic light emitting diode
Ultra-high resolution
Virtual reality
To reference this document use:
http://resolver.tudelft.nl/uuid:1eef71e9-903f-4378-956f-ded0fdd79ccd
DOI
https://doi.org/10.1002/sdtp.11715
TNO identifier
780623
Publisher
Wiley-Blackwell Publishing Ltd
ISSN
1071-0922
Source
SID Symposium Digest of Technical Papers, 48 (1), 623-626
Document type
conference paper