Title
Area-Selective Atomic Layer Deposition of IN2O3:H Using a u Plasma Printer for Local Area Activation
Author
Mameli, A.
Kuang, Y.
Aghaee, M.
Ande, C.K.
Karasulu, B.
Creatore, M.
Mackus, A.J.M.
Kessels, W.M.M.
Roozeboom, F.
Publication year
2017
Subject
TS - Technical Sciences
Nano Technology
Industrial Innovation
ALD
Atomic layer deposition
TFT - Thin Film Technology
To reference this document use:
http://resolver.tudelft.nl/uuid:1baec674-bdbf-4ea5-9b2b-cd59546d2654
DOI
https://doi.org/10.1021/acs.chemmater.6b04469
TNO identifier
745711
Publisher
ACS
Source
Chemistry of Materials, 29 (29), 921-925
Bibliographical note
ACS AuthorChoice - This is an open access article published under a Creative Commons Non-Commercial No Derivative Works (CC-BY-NC-ND) Attribution License, which permits copying and redistribution of the article, and creation of adaptations, all for non-commercial purposes.
Document type
article