Title
Photocrosslinking of ferroelectric polymers and its application in three-dimensional memory arrays
Author
van Breemen, A.J.J.M.
van der Putten, J.B.P.H.
Cai, R.
Reimann, K.
Marsman, A.W.
Willard, N.
de Leeuw, D.M.
Gelinck, G.H.
Publication year
2011
Abstract
An I-line photolithography process for ferroelectric polymers is developed. It is based on photocrosslinking using a bisazide photoinitiator. Patterned layers were realized down to 1-2 µm resolution. Crosslinking yields a close-to-insoluble ferroelectric polymer network that counter intuitively has similar ferroelectric properties as a noncrosslinked film. The negative process is used to stack ferroelectric films on top of each other to make three-dimensional cross-bar arrays of nonvolatile ferroelectric capacitor memories. © 2011 American Institute of Physics.
Subject
Mechatronics, Mechanics & Materials
HOL - Holst
TS - Technical Sciences
Electronics
Ferroelectric capacitors
Ferroelectric polymers
Ferroelectric property
Memory array
Non-crosslinked films
Non-volatile
Patterned layers
Photo-initiator
Photocross-linking
Photolithography process
Ferroelectric devices
Ferroelectricity
Photolithography
Polymers
Three dimensional
Ferroelectric films
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TNO identifier
430686
ISSN
1941-420X
Source
APL: Organic Electronics and Photonics, 4 (5)
Article number
No.: 183302
Document type
article