Title
True-color 640 ppi OLED arrays patterned by CA i-line photolithography
Author
Malinowski, P.E.
Ke, T.
Nakamura, A.
Chang, T.-Y.
Gokhale, P.
Steudel, S.
Janssen, D.
Kamochi, Y.
Koyama, I.
Iwai, Y.
Heremans, P.
Contributor
Morreale, J. (editor)
Publication year
2015
Abstract
In this paper, side-by-side patterning of red, green and blue OLEDs is demonstrated. To achieve 640 ppi arrays with 20 µm subpixel pitch, chemically amplified, i-line photoresist system with submicron resolution was used. These results show feasibility of obtaining full-color displays with ultra-high resolution.
Subject
Nano Technology
HOL - Holst
TS - Technical Sciences
Chemistry
AMOLED displays
Photolithography
RGB OLEDs
To reference this document use:
http://resolver.tudelft.nl/uuid:08a8048d-47c2-4234-8011-097b32cfec91
DOI
https://doi.org/10.1002/sdtp.10332
TNO identifier
533737
ISSN
0097-966X
Source
2015 SID International Symposium, 2 June 2015 through 3 June 2015, 46 (1), 215-218
Series
Digest of Technical Papers - SID International Symposium
Document type
article