Print Email Facebook Twitter True-color 640 ppi OLED arrays patterned by CA i-line photolithography Title True-color 640 ppi OLED arrays patterned by CA i-line photolithography Author Malinowski, P.E. Ke, T. Nakamura, A. Chang, T.-Y. Gokhale, P. Steudel, S. Janssen, D. Kamochi, Y. Koyama, I. Iwai, Y. Heremans, P. Contributor Morreale, J. (editor) Publication year 2015 Abstract In this paper, side-by-side patterning of red, green and blue OLEDs is demonstrated. To achieve 640 ppi arrays with 20 µm subpixel pitch, chemically amplified, i-line photoresist system with submicron resolution was used. These results show feasibility of obtaining full-color displays with ultra-high resolution. Subject Nano TechnologyHOL - HolstTS - Technical SciencesChemistryAMOLED displaysPhotolithographyRGB OLEDs To reference this document use: http://resolver.tudelft.nl/uuid:08a8048d-47c2-4234-8011-097b32cfec91 DOI https://doi.org/10.1002/sdtp.10332 TNO identifier 533737 ISSN 0097-966X Source 2015 SID International Symposium, 2 June 2015 through 3 June 2015, 46 (1), 215-218 Series Digest of Technical Papers - SID International Symposium Document type article Files To receive the publication files, please send an e-mail request to TNO Library.