Print Email Facebook Twitter Is helium ion beam induced processing applicable to EUV mask repair? Title Is helium ion beam induced processing applicable to EUV mask repair? Author Maas, D.J. Bekman, H.H.P.T. van Veldhoven, E. Alkemade, P.F.A. Publication year 2012 Subject Physics & ElectronicsNI - Nano InstrumentationTS - Technical SciencesChemistryIndustrial Innovationhelium ion microscopyion beam induced processingEUV mask repair To reference this document use: http://resolver.tudelft.nl/uuid:067fc9a7-8ca5-40f1-bd4b-45789e35fea2 TNO identifier 463674 Source 15th European Microscopy Congress, 16-21 September 2012, Manchester, UK Document type conference paper Files To receive the publication files, please send an e-mail request to TNO Library.