Title
Atomic Layer Deposition Applications 13
Contributor
Roozeboom, F. (editor)
De Gendt, S. (editor)
Elam, J.W. (editor)
van der Straten, O. (editor)
Dendooven, J. (editor)
Liu, C. (editor)
Publication year
2017
Subject
Nano Technology
HOL - Holst
TS - Technical Sciences
Materials Physics
Industrial Innovation
Atomic layer etching
Atomic layer deposition
ALD
Applications
To reference this document use:
http://resolver.tudelft.nl/uuid:0369ee49-1f63-4de8-9512-2dd470bd513a
TNO identifier
780960
Publisher
ECS
ISBN
9781607688204
ISSN
1938-6737
Series
ECS Transactions
Bibliographical note
The papers contained in this issue of ECS Transactions were originally presented in the symposium on “Atomic Layer Deposition Applications 13”, held during the 232nd meeting of The Electrochemical Society (ECS), Gaylord National Resort and Convention Center in National Harbor, Maryland (USA) from October 1 to 5, 2017.
Document type
conference paper