Print Email Facebook Twitter Area-selective deposition of ruthenium by area-dependent surface diffusion Title Area-selective deposition of ruthenium by area-dependent surface diffusion Author Grillo, F. Soethoudt, J. Marques, E.A. de Martin, L. van Dongen, K. van Ommen, J.R. Delabie, A. Publication year 2020 Subject Atomic layer depositionMetal nanoparticlesMicroelectronicsMonte Carlo methodsRefractory metal compoundsSilicaSiliconSiO2 nanoparticlesSurface diffusionTitanium nitrideVapor depositionDeposition experimentsKinetic modelingKinetic monte carlo simulationMetal nitridesPatterned substratesPrecursor moleculesSurface terminationThreedimensional (3-d)Ruthenium compounds To reference this document use: http://resolver.tudelft.nl/uuid:e636d9d5-71e7-43db-9c21-9cb9f42ab12f TNO identifier 955229 Publisher American Chemical Society ISSN 0897-4756 Source Chemistry of Materials, 32 (32), 9560-9572 Document type article Files To receive the publication files, please send an e-mail request to TNO Library.