Title
Development of APCVD process for high quality TCO
Author
van Deelen, J.
van Mol, A.M.B.
Poodt, P.W.G.
Grob, F.
Spee, C.I.M.A.
TNO Industrie en Techniek
Publication year
2009
Abstract
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use of atmospheric deposition processes allows for large scale roll to roll manufacturing, and is therefore expected to provide a breakthrough for lowering the price of thin film PV modules. 2009 IEEE.
Subject
Materials
Industrial Innovation
Atmospheric deposition process
Atmospheric pressure CVD
High quality
Plasma-enhanced CVD
PV modules
Research and development
Roll to roll manufacturing
Transparent conductive oxides
Atmospheric pressure
Deposition
Meteorological problems
Plasma deposition
Tin
Tin oxides
Titanium compounds
Zinc
Zinc oxide
Chemical vapor deposition
To reference this document use:
http://resolver.tudelft.nl/uuid:834dafb6-8bb1-4890-b9d8-0a72528bb3c8
TNO identifier
352070
ISBN
9781424429509
ISSN
0160-8371
Source
2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009, 7 June 2009 through 12 June 2009, Philadelphia, PA, USA. reference code: 79913, 271-275
Article number
No.: 5411680
Document type
conference paper