Title
Characterizing electron beam induced damage in metrology and inspection of advance devices
Author
Mohtashami, A.
Navarro, V.
Sadeghian Marnani, H.
Englard, I.
Shemesh, D.
Malik, N.S.
Contributor
Finders, J. (editor)
Behringer, U.F.W. (editor)
Publication year
2017
Subject
Nano Technology
OM - Opto-Mechatronics
TS - Technical Sciences
Electronics
Chemical mechanical polishing
Chemical polishing
Electron beams
Hydrophobicity
Semiconductor device manufacture
Silicon wafers
Units of measurement
300-mm silicon wafers
E-beam damage
High resolution
Low-k materials
Optical metrology techniques
Scanning probe microscopy techniques
Semiconductor industry
Semiconductor manufacturing
Scanning probe microscopy
To reference this document use:
http://resolver.tudelft.nl/uuid:6b136f55-7c8e-4f7a-94ba-8bab9b85a0b3
TNO identifier
781876
Publisher
SPIE
ISBN
9781510613560
ISSN
0277-786X
Source
33rd European Mask and Lithography Conference, EMLC 2017, 26-28 June 2017, Dresden, Germany, 10446
Series
Proceedings of SPIE - The International Society for Optical Engineering
Article number
104460U
Document type
conference paper