Title
High throughput, parallel scanning probe microscope for nanometrology and nanopatterning applications
Author
Sadeghian Marnani, H.
Paul, P.C.
Herfst, R.W.
Dekker, A.
Winters, J.
Maturova, K.
Publication year
2017
Abstract
Scanning Probe microscope (SPM) is an important nanoinstrument for several applications such as bioresearch, metrology, inspection and nanopatterning. Single SPM is associated with relatively slow rate of scanning and low throughput measurement, thus not being suitable for scanning large samples such as semiconductor wafers and photolithography masks. Over the last few years we have developed a parallel high throughput SPM. This has been done by miniaturizing the SPM systems and operating many of them simultaneously. Each miniaturized SPM can be operated independently. The parallel SPM also allows the measurement of several physical parameters simultaneously; while one instrument measures nano-scale topography, another instrument can measure mechanical, electrical or thermal properties, making it a Lab-on-an-Instrument. Recently in collaboration with SwissLitho AG, thermal scanning probe lithography has also been integrated into the miniaturized SPM. This enables the fabrication of nanostructures with one or more miniaturized SPM. Moreover, an automated cantilever exchange and optical alignment system is also developed. Various types of SPM cantilevers can be exchanged in 6 seconds with an accuracy better than 2 μm. The exchange and alignment unit is miniaturized to allow for integration in the parallel SPM. Ten thousand continuous exchange and alignment cycles were performed without failure. The proof of principle (PoP) of such a mechatronics instrument will be presented in this talk. This instrument provides new research opportunities in the nanometrology and nanopatterning of wafers and nanolithography masks by enabling real die-to-die and wafer-level measurements and in cell biology by measuring the nano-scale properties of a large number of cells.
Subject
Nano Technology
OM - Opto-Mechatronics
TS - Technical Sciences
High Tech Systems & Materials
Electronics
Industrial Innovation
Cytology
Intelligent mechatronics
Lithography
Nanocantilevers
Nanotechnology
Silicon wafers
Optical alignment systems
Photolithography masks
Physical parameters
Proof of principles
Research opportunities
Scanning probe lithography
Semi-conductor wafer
Throughput measurements
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http://resolver.tudelft.nl/uuid:3a1b30d1-c51b-45b7-bf96-4e41d4f0b34e
TNO identifier
781410
Publisher
Institute of Electrical and Electronics Engineers IEEE
ISBN
9781509059980
Source
2017 IEEE International Conference on Advanced Intelligent Mechatronics, AIM 2017, 3-7 July 2017, 700-705
Article number
8014099
Document type
conference paper