Print Email Facebook Twitter Progress in EUV optics lifetime expectations Title Progress in EUV optics lifetime expectations Author Mertens, B.M. Weiss, M. Meiling, H. Klein, R. Louis, E. Kurt, R. Wedowski, M. Trenkler, H. Wolschrijn, B.T. Jansen, R. van de Runstraat, A. Moors, R. Spee, C.I.M.A. Plöger, S. van de Kruijs, R. Technisch Physische Dienst TNO - TH Publication year 2004 Abstract Optics lifetime and contamination is one of the major challenges for extreme ultraviolet (EUV) lithography. The basic contamination and lifetime limiting processes are carbon growth and oxidation of the mirrors. Without appropriate measures, optics lifetime will be limited to a few hours. Within the EUV α-tool project of ASML and Carl Zeiss, several potential solutions towards improvement of optics life time are being studied: vacuum improvement, capping layers for oxidation protection, mitigation of carbon growth and development of efficient cleaning techniques that are soft to the mirror. For instance, we have been able to identify a capping layer that shows carbon growth even under extremely oxidizing conditions. The current status of our experiments leads us to believe that a lifetime of 1000 h is within reach. Subject Cap layersCarbon growthEUV lithographyOptics lifetimeOxidationAuger electron spectroscopyCrack initiationHydrocarbonsImaging techniquesLithographyMicroopticsMirrorsOptical systemsOptics lifetimeUltraviolet radiation To reference this document use: http://resolver.tudelft.nl/uuid:11bcae1d-3135-4abf-9348-bc6419421e09 TNO identifier 237782 Publisher Elsevier, Amsterdam ISSN 0167-9317 Source Microelectric Engineering, 73-74, 16-22 Bibliographical note Als paper gepresenteerd op: Micro and Nano Engineering 2003, 22-25 September 2003, Cambridge, UK Document type article Files To receive the publication files, please send an e-mail request to TNO Library.