Print Email Facebook Twitter Spatial Atomic Layer Deposition for large area and flexible electronics Title Spatial Atomic Layer Deposition for large area and flexible electronics Author van den Bruele, F.J. Grob, F. Creyghton, Y.L.M. Shen, J. Bolt, P. Poodt, P.W.G. Publication year 2021 Subject Atmospheric pressureAtomic layer depositionSpatial ALDAtmospheric processIndustrial Innovation To reference this document use: http://resolver.tudelft.nl/uuid:0823549a-4087-45f4-beeb-0031dbc0cd23 TNO identifier 958054 Bibliographical note SVC Techcon 2021, 64th Annual SVC Technical Conference, May 3 - 7, 2021 Document type public lecture Files To receive the publication files, please send an e-mail request to TNO Library.