Print Email Facebook Twitter Atomic Layer Deposition Applications 13 Title Atomic Layer Deposition Applications 13 Contributor Roozeboom, F. (editor) De Gendt, S. (editor) Elam, J.W. (editor) van der Straten, O. (editor) Dendooven, J. (editor) Liu, C. (editor) Publication year 2017 Subject Nano TechnologyHOL - HolstTS - Technical SciencesMaterials PhysicsIndustrial InnovationAtomic layer etchingAtomic layer depositionALDApplications To reference this document use: http://resolver.tudelft.nl/uuid:0369ee49-1f63-4de8-9512-2dd470bd513a TNO identifier 780960 Publisher ECS ISBN 9781607688204 ISSN 1938-6737 Series ECS Transactions Bibliographical note The papers contained in this issue of ECS Transactions were originally presented in the symposium on “Atomic Layer Deposition Applications 13”, held during the 232nd meeting of The Electrochemical Society (ECS), Gaylord National Resort and Convention Center in National Harbor, Maryland (USA) from October 1 to 5, 2017. Document type conference paper Files To receive the publication files, please send an e-mail request to TNO Library.